Formation damage due to asphaltene precipitation/deposition is an undeniable issue in the oil and gas industry with reservoirs, wells, pipelines, and surface facilities experiencing damage during oil production, transportation, and processing.
Different physical and chemical treatments have been introduced and used in industry, but researchers and engineers have difficulty in detailed understanding of the mechanisms and selecting suitable economic and environmental methods for treatment.
Asphaltene Deposition Control by Chemical Inhibitors is the most advanced reference focused on chemical dispersants and inhibitors from both an experimental and modeling viewpoint. Adequate knowledge of the effective parameters in each treatment method, interactions, mechanisms, and economic viewpoints involved in asphaltene treatment are crucial for future development, recovery forecast, and reserve prediction and this reference delivers in all these aspects.
Starting out with the environmental impacts of asphaltene deposition, this reference covers control and prevention methods before moving on to the experimental methods, both static and dynamic, to test the effectiveness of inhibitors on restricting asphaltene deposition.
Rounding out with modelling methods used to simulate asphaltene-inhibitor interactions and a workflow to select suitable inhibitors by technical, economic, and environmental considerations, this book gives today’s engineers and researchers the right tool to mitigate formation damage in a sustainably responsible way.
About the authors
Ali Ghamartale is a PhD candidate in the Department of Process Engineering; Shokufe Afzali has a PhD in process engineering and is currently working as a researcher at Neste Oyj; Nima Rezaei is an assistant professor in the Department of Separation Science, LUT University; and Dr. Sohrab Zendehboudi is an associate professor and Statoil Chair in Reservoir Analysis in the Department of Process Engineering.
Asphaltene Deposition Control by Chemical Inhibitors is published by Elsevier.